Speaker
Description
The rapid advancement of nanotechnology in micro‑optics and optoelectronics demands precise three‑dimensional structures below the micrometer scale. This study investigates the resolution limits of greyscale electron‑beam lithography on PMMA resist using a Raith e_Line plus system. Contrast curves were measured to calibrate dose‑dependent resist development, enabling controlled fabrication of stepped- and sawtooth‑shaped elements with submicrometer widths. AFM and SEM analyses confirmed reproducible high‑aspect‑ratio structures that surpass previously reported performance for PMMA. We discuss instrumental and exposure‑parameter constraints and propose avenues for further optimization, including alternative resists and imaging methods. These findings underscore the potential of greyscale lithography for high‑precision micro‑optical components such as diffractive lenses
